MESOPOROUS SILICA SUPPORTING CESIUM ION ADSORPTIVE COMPOUND, AND CESIUM ION COLLECTOR AND CESIUM COLLECTING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide a Cs ion collector effectively and inexpensively collecting radioactive Cs.SOLUTION: A highly ordered mesoporous silica (HOMS) manufactured from an organic silicon compound and a surfactant supports a Cs ion adsorptive compound such as DPAR selectively absorbing cesi...

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Hauptverfasser: ELSAFTY SHERIF, HARADA YUKIAKI, MOHAMED SHENASHEN
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a Cs ion collector effectively and inexpensively collecting radioactive Cs.SOLUTION: A highly ordered mesoporous silica (HOMS) manufactured from an organic silicon compound and a surfactant supports a Cs ion adsorptive compound such as DPAR selectively absorbing cesium (Cs) as a target element. HOMS supporting a Cs ion adsorptive compound is contacted with a solution dissolving Cs, and Cs ions are selectively adsorbed in a Cs ion adsorptive compound supported on HOMS. HOMS supporting a Cs ion adsorptive compound with Cs ions being adsorbed is subjected to chemical treatment, and Cs ions as a target element are liberated from the Cs ion adsorptive compound supported on HOMS to collect Cs. HOMS supporting a Cs ion adsorptive compound with Cs ions being liberated can be reused. HOMS supporting this Cs ion adsorptive compound can be also used as a Cs collector/concentration detection sensor/radioactive cesium remover.