LASER PRINTING METHOD FOR NTD SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To provide a laser printing method for a semiconductor substrate, capable of displaying a character pattern and a discrimination pattern with an uneven shaped printing dot engraving having an excellent depth for visibility even for an NTD silicon wafer by using a YVO4 laser bea...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SAKAGUCHI HIROSHI, TAKEDA HISAO, YAO NORIAKI, WARATANI SHUZO, MAIKUMA KEN
Format: Patent
Sprache:eng
Schlagworte:
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