METHOD FOR POSITIONING NANOPARTICLE ON SUBSTRATE

PROBLEM TO BE SOLVED: To provide methods for uniformly depositing nanoparticles on a substrate over large areas.SOLUTION: The invention is directed to a method for positioning the nanoparticles on a patterned substrate. The method comprises: a step of providing a patterned substrate with selectively...

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Bibliographische Detailangaben
Hauptverfasser:	ROBERT L SANDSTROM, BLACK CHARLES THOMAS, CHRISTOPHER B MURRAY
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide methods for uniformly depositing nanoparticles on a substrate over large areas.SOLUTION: The invention is directed to a method for positioning the nanoparticles on a patterned substrate. The method comprises: a step of providing a patterned substrate with selectively positioned recesses; and a step of applying a solution or suspension of the nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and then a substantial number of the remaining portion of the applied nanoparticles are left disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.