APPARATUS AND METHOD FOR INSPECTION AND MEASUREMENT

PROBLEM TO BE SOLVED: To realize both high sensitivity and high stability of an inspection in a measurement apparatus or inspection apparatus using a charged particle beam.SOLUTION: An electrification control electrode B421 is installed at a measured or inspected specimen side of an electrification...

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Hauptverfasser: TEI TOMOKI, TSUNO NATSUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To realize both high sensitivity and high stability of an inspection in a measurement apparatus or inspection apparatus using a charged particle beam.SOLUTION: An electrification control electrode B421 is installed at a measured or inspected specimen side of an electrification control electrode A420, and a constant voltage is applied from an electrification control electrode control portion 423 of the electrification control electrode B according to an electrification state of a specimen, thereby suppressing a variation of an electrification state and a potential barrier of a specimen surface formed before an inspection. A retarding potential is applied by an electrification control electrode control portion 66, and the electrification control electrode B421 is disposed further below the electrification control electrode A420 adjusted to have the same potential as a specimen. As a result, it is possible to adjust the number of secondary electrons 409 which are emitted from a specimen such as a wafer 9 to which a primary electron beam 19 is applied and return to the specimen, and thus it is possible to stably maintain an inspection condition of high sensitivity during an inspection.