COMPOSITION FOR FORMING METAL OXIDE FILM

COMPOSITION FOR FORMING METAL OXIDE FILM

PROBLEM TO BE SOLVED: To provide a composition for forming a metal oxide film, having excellent and uniform application properties for various substrates.SOLUTION: The composition for forming a metal oxide film contains: [A] a compound including at least one metal element (a) selected from a group o...

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Hauptverfasser: MOTONARI MASAYUKI, TAKANASHI KAZUNORI, TAKIMOTO YOSHIO
Format: Patent
Sprache:eng
Schlagworte:
CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
INORGANIC CHEMISTRY
METALLURGY
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creator MOTONARI MASAYUKI
TAKANASHI KAZUNORI
TAKIMOTO YOSHIO
description PROBLEM TO BE SOLVED: To provide a composition for forming a metal oxide film, having excellent and uniform application properties for various substrates.SOLUTION: The composition for forming a metal oxide film contains: [A] a compound including at least one metal element (a) selected from a group of metal elements with atomic numbers of 23-78, and at least one ligand (b) selected from a group ofO-O,O-S,O-O-SO-O,O-SO-O-O-SO-O, andO-C(=O)-O-O; [B] a surfactant; and [C] a solvent.
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subjects CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
INORGANIC CHEMISTRY
METALLURGY
title COMPOSITION FOR FORMING METAL OXIDE FILM
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