COMPOSITION FOR FORMING METAL OXIDE FILM

PROBLEM TO BE SOLVED: To provide a composition for forming a metal oxide film, having excellent and uniform application properties for various substrates.SOLUTION: The composition for forming a metal oxide film contains: [A] a compound including at least one metal element (a) selected from a group o...

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Bibliographische Detailangaben
Hauptverfasser:	MOTONARI MASAYUKI, TAKANASHI KAZUNORI, TAKIMOTO YOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F INORGANIC CHEMISTRY METALLURGY
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a composition for forming a metal oxide film, having excellent and uniform application properties for various substrates.SOLUTION: The composition for forming a metal oxide film contains: [A] a compound including at least one metal element (a) selected from a group of metal elements with atomic numbers of 23-78, and at least one ligand (b) selected from a group ofO-O,O-S,O-O-SO-O,O-SO-O-O-SO-O, andO-C(=O)-O-O; [B] a surfactant; and [C] a solvent.