FILM FORMING METHOD

PROBLEM TO BE SOLVED: To provide a film forming method capable of forming a coating work table for reliably washing out deposited coating slag by forming a lubricating film.SOLUTION: The film forming method includes: a first washing step of washing out impurities, deposited on a surface of a drainin...

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1. Verfasser: TSURUMI KAZUNORI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film forming method capable of forming a coating work table for reliably washing out deposited coating slag by forming a lubricating film.SOLUTION: The film forming method includes: a first washing step of washing out impurities, deposited on a surface of a draining board for work, by using chemical; a surface treatment step of blasting a surface of the draining board to set the surface roughness of the surface of the draining board to be substantially uniform; a second washing step of washing out impurities, deposited on the surface of the draining board, by using chemical; an electroless plating step of immersing the entire draining board, in a plating tank storing composite plating liquid with fine particles being mixed in the nickel plating liquid, for the predetermined time; and a heat treatment step of executing the heat treatment of the draining board in a drying furnace after washing the draining board, taken out of the plating tank, with water.