LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or an interface between gas/liquid and a final element on the final element or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure...

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Hauptverfasser: MIRANDA MARCIO ALEXANDRE CANO, NOORDAM LAMBERTUS DOMINICUS, JANSEN HANS, JORRITSMA LAURENTIUS CATRINUS, BRUIJSTENS JEROEN PETER JOHANNES, JANSEN BAUKE, TANASA GHEORGHE, THOMAS IVO ADAM JOHANNES, BRULS RICHARD JOSEPH, SIEBE LANDHEER, MEESTER ARNOUT JOHANNES, VAN DER LEE MAURICE MARTINUS JOHANNES
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or an interface between gas/liquid and a final element on the final element or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets lying on a final element of the projection system or substantially avoiding such droplet formation.