DEVELOPING ROLLER

PROBLEM TO BE SOLVED: To provide a technique to implement resistance of about 4-8 Log cm while suppressing variations in resistance in a developing roller, and to provide a developing roller for which there is a rapid rate of decay of the surface potential, and for which image defects due to the acc...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KONO KOTA, TAGAWA HIROTAKA, SUGIMURA TAKASHI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a technique to implement resistance of about 4-8 Log cm while suppressing variations in resistance in a developing roller, and to provide a developing roller for which there is a rapid rate of decay of the surface potential, and for which image defects due to the accumulation of a charge do not occur.SOLUTION: A developing roller is equipped with a shaft 1, an elastic layer 2 supported on the outer circumference of the shaft 1, and at least one coated film layer formed on the outer circumferential surface of the elastic layer 2. At least one of the coated film layers contains 0.1-2.5 pts.mass of an ionic liquid with respect to 100 pts.mass of resin components.