FILM THICKNESS MEASURING APPARATUS AND FILM THICKNESS MEASURING METHOD

PROBLEM TO BE SOLVED: To provide a film thickness measuring apparatus capable of measuring a film thickness easily without etching and a film thickness measuring method.SOLUTION: A film thickness measuring apparatus comprises: a cutting section 1 for cutting a part of the film surface of a film S1 f...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SAKAUCHI YUYA, ANDRE CYMONE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film thickness measuring apparatus capable of measuring a film thickness easily without etching and a film thickness measuring method.SOLUTION: A film thickness measuring apparatus comprises: a cutting section 1 for cutting a part of the film surface of a film S1 formed on a substrate S to expose a substrate surface and a measuring section for measuring a film thickness of the film by measuring the difference in levels of the exposed substrate surface and the film surface. The cutting section 1 has a blade section 20 on which a blade 21 for cutting a film surface is mounted; a moving means for moving the blade section 20; and pressing means for pressing the blade 21 to the substrate. In a state in which the blade 21 is pressed to the substrate S by the pressing means, a part of the film surface is cut by moving the blade section 20.