ELECTROSTATIC CHUCK DEVICE

PROBLEM TO BE SOLVED: To provide an electrostatic chuck where crack or the like is not likely to occur in an electrostatic shuck portion even when the temperature of a platy specimen to be placed is abruptly raised and dropped, and which has excellent durability, small heat capacity, excellent heat...

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Bibliographische Detailangaben
Hauptverfasser: SATO TAKASHI, HAYAHARA RYUJI, ISHIMURA KAZUNORI, MORIYA YOSHIAKI, WATANABE TSUYOSHI, KOSAKAI MAMORU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an electrostatic chuck where crack or the like is not likely to occur in an electrostatic shuck portion even when the temperature of a platy specimen to be placed is abruptly raised and dropped, and which has excellent durability, small heat capacity, excellent heat exchange efficiency and heat responsivity with the platy specimen, easily keeps the in-plane temperature of the platy specimen at a required temperature patten, and prevents a pattern of a heater from being reflected on the platy specimen.SOLUTION: An electrostatic chuck device 21 includes: an electrostatic chuck portion 22 having a placing surface 31a on which a platy specimen W is placed, and provided with an electrostatic attraction internal electrode 33; a temperature adjusting base portion 23 formed with a flow channel 41 in which a heat medium is circulated; a heater element 25 of a thin plate shape which is disposed between the electrostatic chuck portion 22 and the temperature adjusting base portion 23 and made from non-magnetic metal with a thickness of 200 μm or less; and organic system adhesive layers 24a and 24b of a two-layer structure adhering and integrating the electrostatic chuck portion 22 and the temperature adjusting base portion 23, and clipping the heater element 25.