LITHOGRAPHIC APPARATUS AND COMPONENT

PROBLEM TO BE SOLVED: To provide a lithographic apparatus which facilitates transfer of heat to components, from components, or between components.SOLUTION: A lithographic apparatus 100 includes a substrate table WT configured to hold a substrate WA, and a projection system PS configured to project...

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Bibliographische Detailangaben
Hauptverfasser:	ROGER WILHELMUS ANTONIUS HENRICUS SCHMITZ, JANSSEN FRANCISCUS JOHANNES J, PAULUS ALBERTUS MARIA HASELING, SVEN PEKELDER, HAN-KWANG NIENHUYS, ALEXANDER MARINUS ARNORDUS HEIBERTS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic apparatus which facilitates transfer of heat to components, from components, or between components.SOLUTION: A lithographic apparatus 100 includes a substrate table WT configured to hold a substrate WA, and a projection system PS configured to project a patterned radiation beam onto a target portion of the substrate WA. A surface of a component, such as a wall of the projection system PS, the substrate table WT, a mirror 28, a heat sink and an internal chamber wall, of the lithographic apparatus 100 that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.