MANUFACTURING METHOD OF THIN FILM DEVICE, THIN FILM DEVICE BASE MATERIAL, AND THIN FILM DEVICE

PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film device which enables a well known formation method of a device element to be generally used and achieves excellent quality.SOLUTION: As one example, a manufacturing method of a thin film device includes: a lamination process where an insulation layer 12 is laminated on the front surface side of a ferromagnetic layer 11 to obtain a flexible thin film device base material; a support plate adhesion process where a magnetic plate 21 attracting and attracted by the ferromagnetic layer is adhered to the rear surface side of the ferromagnetic layer with a magnetic force to support the thin film device base material; an element formation process where a device element 13 is formed on the insulation layer of the thin film device base material; and a support plate removal process where the magnetic plate 21 is removed from the rear surface side of the ferromagnetic layer.