ETCHING DEVICE, MANUFACTURING METHOD OF SOLAR CELL, AND SOLAR CELL

PROBLEM TO BE SOLVED: To provide a manufacturing method of a solar cell capable of manufacturing a solar cell having high generation efficiency with a high yield by forming a uniform texture in a silicon substrate surface by reducing cation concentration in an etching liquid by a texture etching ste...

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Hauptverfasser: YASUNAGA NOZOMI, KARAKIDA SHOICHI, NONOGAKI MITSUHIRO, KOBAYASHI JUNJI, OSHIRO YUSUKE, MURAKAMI TOSHIYA, YOSHIDA YASUHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing method of a solar cell capable of manufacturing a solar cell having high generation efficiency with a high yield by forming a uniform texture in a silicon substrate surface by reducing cation concentration in an etching liquid by a texture etching step which uses an alkali solution and using a substrate whose surface is not contaminated.SOLUTION: A texture etching device (etching device) 100 for etching a silicon substrate 8 containing a p- or n-type dopant by immersing the silicon substrate in an etching liquid 9 comprises: an etching bath 1 which stores the etching liquid 9; and a first cation removal device 4A and a second cation removal device 4B which adsorb and collect the cations which are eluted into the etching liquid 9.