METHOD FOR MANUFACTURING ORIGINAL PLATE FOR PATTERN ALIGNMENT LAYER FOR STEREOSCOPIC DISPLAY
PROBLEM TO BE SOLVED: To provide a method for manufacturing an original plate for pattern alignment layers for stereoscopic display for highly accurately, easily, and massively manufacturing pattern retardation films for stereoscopic display devices.SOLUTION: The manufacturing method includes: a fir...
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| creator | KOIWA MITSUMASA KATO KEI KOSAKA YOSUKE |
| description | PROBLEM TO BE SOLVED: To provide a method for manufacturing an original plate for pattern alignment layers for stereoscopic display for highly accurately, easily, and massively manufacturing pattern retardation films for stereoscopic display devices.SOLUTION: The manufacturing method includes: a first polishing step for forming a first asperity structure area on the surface of a first layer comprising an inorganic material; a second layer forming step for pattern-forming a belt-like resist part on the surface of the first layer, then forming a second layer film comprising the inorganic material on the surfaces of the resist part and a non-resist part to form a second layer pattern on the non-resist part; a second polishing step for polishing the surface of the second layer film in the direction different from that of the first asperity structure to form a second asperity structure area; and a resist peeling step for peeling the resist part and the second layer film on the resist part. |
| format | Patent |
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a second layer forming step for pattern-forming a belt-like resist part on the surface of the first layer, then forming a second layer film comprising the inorganic material on the surfaces of the resist part and a non-resist part to form a second layer pattern on the non-resist part; a second polishing step for polishing the surface of the second layer film in the direction different from that of the first asperity structure to form a second asperity structure area; and a resist peeling step for peeling the resist part and the second layer film on the resist part.</description><language>eng</language><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; FREQUENCY-CHANGING ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; 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a second layer forming step for pattern-forming a belt-like resist part on the surface of the first layer, then forming a second layer film comprising the inorganic material on the surfaces of the resist part and a non-resist part to form a second layer pattern on the non-resist part; a second polishing step for polishing the surface of the second layer film in the direction different from that of the first asperity structure to form a second asperity structure area; and a resist peeling step for peeling the resist part and the second layer film on the resist part.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | METHOD FOR MANUFACTURING ORIGINAL PLATE FOR PATTERN ALIGNMENT LAYER FOR STEREOSCOPIC DISPLAY |
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