METHOD FOR MANUFACTURING ORIGINAL PLATE FOR PATTERN ALIGNMENT LAYER FOR STEREOSCOPIC DISPLAY

PROBLEM TO BE SOLVED: To provide a method for manufacturing an original plate for pattern alignment layers for stereoscopic display for highly accurately, easily, and massively manufacturing pattern retardation films for stereoscopic display devices.SOLUTION: The manufacturing method includes: a fir...

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Bibliographische Detailangaben
Hauptverfasser: KOIWA MITSUMASA, KATO KEI, KOSAKA YOSUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing an original plate for pattern alignment layers for stereoscopic display for highly accurately, easily, and massively manufacturing pattern retardation films for stereoscopic display devices.SOLUTION: The manufacturing method includes: a first polishing step for forming a first asperity structure area on the surface of a first layer comprising an inorganic material; a second layer forming step for pattern-forming a belt-like resist part on the surface of the first layer, then forming a second layer film comprising the inorganic material on the surfaces of the resist part and a non-resist part to form a second layer pattern on the non-resist part; a second polishing step for polishing the surface of the second layer film in the direction different from that of the first asperity structure to form a second asperity structure area; and a resist peeling step for peeling the resist part and the second layer film on the resist part.