THERMAL FLUX PROCESSING BY SCANNING

THERMAL FLUX PROCESSING BY SCANNING

PROBLEM TO BE SOLVED: To provide a method of heating only a surface of a substrate and reducing thermal history.SOLUTION: The thermal processing device includes a stage 216, a continuous wave (CW) electromagnetic radiation source 202, a series of lenses 210, a translation mechanism 218, and a contro...

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Bibliographische Detailangaben
Hauptverfasser: MARK YAM, MAJUH ABHILASH J, PAUL A O'BRIEN, BEHRENS VERNON, ALEXANDER GOLDIN, LEONID M TERTITSKI, DEAN C JENNINGS
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of heating only a surface of a substrate and reducing thermal history.SOLUTION: The thermal processing device includes a stage 216, a continuous wave (CW) electromagnetic radiation source 202, a series of lenses 210, a translation mechanism 218, and a controller 226. The stage is configured to receive a substrate 214. The CW electromagnetic radiation source is disposed next to the stage, and configured to emit CW electromagnetic radiation along a path toward the substrate. The series of lenses are disposed between the CW electromagnetic radiation source and the stage, and configured to condense CW electromagnetic radiation into a line 222 of CW electromagnetic radiation on a surface of the substrate.