PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, PROTECTIVE FILM, PHOTOSPACER, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE, AND SOLID-STATE IMAGING ELEMENT
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has excellent polymerization curability when exposed to light and high exposure sensitivity and which is capable of forming a color pattern having excellent profile characteristics, a photospacer having excellent cross-section...
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| creator | MOROZUMI KAZUMA FUKUSHIGE YUICHI KOBAYASHI HIROMI |
| description | PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has excellent polymerization curability when exposed to light and high exposure sensitivity and which is capable of forming a color pattern having excellent profile characteristics, a photospacer having excellent cross-sectional shape uniformity and excellent height uniformity, and a protective film having excellent uniformity and hardness even with a short heating time.SOLUTION: The photosensitive resin composition contains (A) an alkali-soluble resin that has a group having an acidic group and two or more polymerizable unsaturated groups different from each other in at least side chains, (B) a polymerizable compound and (C) a photopolymerization initiator. |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, PROTECTIVE FILM, PHOTOSPACER, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE, AND SOLID-STATE IMAGING ELEMENT |
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