PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, PROTECTIVE FILM, PHOTOSPACER, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE, AND SOLID-STATE IMAGING ELEMENT

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has excellent polymerization curability when exposed to light and high exposure sensitivity and which is capable of forming a color pattern having excellent profile characteristics, a photospacer having excellent cross-section...

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Bibliographische Detailangaben
Hauptverfasser: MOROZUMI KAZUMA, FUKUSHIGE YUICHI, KOBAYASHI HIROMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has excellent polymerization curability when exposed to light and high exposure sensitivity and which is capable of forming a color pattern having excellent profile characteristics, a photospacer having excellent cross-sectional shape uniformity and excellent height uniformity, and a protective film having excellent uniformity and hardness even with a short heating time.SOLUTION: The photosensitive resin composition contains (A) an alkali-soluble resin that has a group having an acidic group and two or more polymerizable unsaturated groups different from each other in at least side chains, (B) a polymerizable compound and (C) a photopolymerization initiator.