METHOD FOR MANUFACTURING MOLD FOR MANUFACTURING BIT PATTERNED MEDIUM, AND MOLD FOR MANUFACTURING BIT PATTERNED MEDIUM

PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold for manufacturing a bit patterned medium, by which drawing time can be reduced, finer bits for improving a recording density can be formed and shapes of bits are relatively easily controlled.SOLUTION: The method aims to manufacture a...

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Bibliographische Detailangaben
Hauptverfasser: HOGEN MORIHISA, ISHIKAWA MIKIO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold for manufacturing a bit patterned medium, by which drawing time can be reduced, finer bits for improving a recording density can be formed and shapes of bits are relatively easily controlled.SOLUTION: The method aims to manufacture a mold for manufacturing a bit patterned medium having a data track region (servo region) where a plurality of magnetic regions each comprising a magnetic material and functions as a minimum magnetization inversion unit are arranged in a separated state from one another by a nonmagnetic region. The method includes: a step of preparing a substrate having a photosensitive resin film formed thereon as a resist; and an electron beam drawing step of irradiating the photosensitive resin film with a single shot of an electron beam spot that is controlled to have an elongated irradiation pattern on the plane of the photosensitive resin film, thereby forming an elongated latent image corresponding to the shape of the magnetic region comprising the magnetic material functioning as the minimum magnetization inversion unit.