METHOD FOR CONTINUOUSLY CASTING POLYCRYSTALLINE SILICON

PROBLEM TO BE SOLVED: To provide a method for continuously casting polycrystalline silicon which can prevent the generation of a side arc by suppressing the adhesion of silicon to the tip of a plasma torch caused by the jump of molten silicon with the falling of a raw material charged into a mold.SO...

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Bibliographische Detailangaben
Hauptverfasser: FUKUSHIMA SHINYA, MAEKAWA KOICHI, YOSHIHARA MITSUO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for continuously casting polycrystalline silicon which can prevent the generation of a side arc by suppressing the adhesion of silicon to the tip of a plasma torch caused by the jump of molten silicon with the falling of a raw material charged into a mold.SOLUTION: In the continuous casting method using electromagnetic induction heating and plasma arc heating, the plasma torch is made to scan in the direction perpendicular to the raw material 3 charging direction or at least one direction included in two angles of θ among four angles formed by two diagonal lines in the cross section of the mold 2, and the charge of the raw material into the mold is carried out with a charging angle and height adjusted in the rectangular direction to the side wall of the mold on the charging side to make the charged raw material collide with the plasma torch located at the center of the mold (the falling point of the raw material is deviated from the center of the mold).