SUBSTRATE COATING METHOD AND SUBSTRATE COATING DEVICE AS WELL AS ORGANIC ELECTROLUMINESCENT ELEMENT PRODUCTION METHOD USING THE METHOD

PROBLEM TO BE SOLVED: To limit solution deterioration such as drying, oxidation, etc. of a coating solution inside the slit nozzle during standby in substrate coating methods and devices that coat coating solutions on substrates using slit nozzles.SOLUTION: The substrate coating method includes: a f...

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Bibliographische Detailangaben
Hauptverfasser: KAWAGUCHI KEIJI, YOSHIDA KAZUJI, KUZUOKA YOSHIKAZU, ISOKAWA YOSHINORI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To limit solution deterioration such as drying, oxidation, etc. of a coating solution inside the slit nozzle during standby in substrate coating methods and devices that coat coating solutions on substrates using slit nozzles.SOLUTION: The substrate coating method includes: a first process of forming a coating film by coating a coating solution 20 from a slit nozzle 31; a second process of standing by without coating the coating solution 20 on the next substrate; and a third process of discharging the coating solution 20 onto a roller part 50 that is disposed below the slit nozzle 31 with an interval from the discharge opening 30 thereof. In the second process, the coating solution 20 is discharged from the slit nozzle 31 onto the roller part 50, thereby circulating the coating solution 20 appropriately so that solution deterioration such as drying, oxidation, etc. of the coating solution 20 inside the slit nozzle 31 can be limited.