METHOD OF MANUFACTURING NANO-STRUCTURE, AND NANO-STRUCTURE

PROBLEM TO BE SOLVED: To form a nano-structure layer through a mask comprising a block copolymer finely patterned in a temperature atmosphere lower than the glass transition temperature of a workpiece, and to contribute to the fine patterning technique field.SOLUTION: A coating layer is formed by co...

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Bibliographische Detailangaben
Hauptverfasser: ENOURA TAEKO, KAGOHASHI TSUTOMU
Format: Patent
Sprache:eng
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