METHOD OF MANUFACTURING NANO-STRUCTURE, AND NANO-STRUCTURE

PROBLEM TO BE SOLVED: To form a nano-structure layer through a mask comprising a block copolymer finely patterned in a temperature atmosphere lower than the glass transition temperature of a workpiece, and to contribute to the fine patterning technique field.SOLUTION: A coating layer is formed by co...

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Bibliographische Detailangaben
Hauptverfasser:	ENOURA TAEKO, KAGOHASHI TSUTOMU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MINERAL OR SLAG WOOL NANOTECHNOLOGY PERFORMING OPERATIONS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To form a nano-structure layer through a mask comprising a block copolymer finely patterned in a temperature atmosphere lower than the glass transition temperature of a workpiece, and to contribute to the fine patterning technique field.SOLUTION: A coating layer is formed by coating a nano-processed surface of the workpiece with the block copolymer composed of two kinds of polymer components and having a lower glass transition temperature than the workpiece. The finely patterned mask is formed by selectively etching the coating layer, and the workpiece is etched through the mask to form the nano-structure layer.