PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, FORMING METHOD FOR RIB PATTERN, FORMING METHOD FOR HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that is excellent in fine pattern forming properties, has a high elasticity in a cured product, has excellent heat and moisture resistance, and also has excellent hollow-structure maintainability.SOLUTION: A photosensitive resin com...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KATO SADAAKI, FUJII SHINJIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS BASIC ELECTRONIC CIRCUITRY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RESONATORS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!