APPARATUS AND METHOD FOR CLEANING POLYCRYSTALLINE SILICON

PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning polycrystalline silicon, with which a vessel with polycrystalline silicon stored therein is smoothly and certainly transported between cleaning tanks, and with which working efficiency is improved and stable quality is maintaine...

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1. Verfasser: ATSUMI TETSUYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning polycrystalline silicon, with which a vessel with polycrystalline silicon stored therein is smoothly and certainly transported between cleaning tanks, and with which working efficiency is improved and stable quality is maintained.SOLUTION: In the apparatus 1 for cleaning polycrystalline silicon, the polycrystalline silicon S is immersed in the cleaning tanks 21-27 and cleaned while being stored in the vessel 3, and the apparatus 1 has a guide frame 5 to hold the vessel 3 in a loaded state on the inner bottom section of each of the cleaning tanks 21-27. A plurality of guide plates 52 to guide the introduction of the vessel 3 from the upper side is provided on the guide frame 5 while being inclined to a direction further apart from the holding center of the guide frame 5 as going to the upper side.