METHOD FOR MANUFACTURING CYLINDER FOR INTAGLIO PRINTING AND CYLINDER FOR INTAGLIO PRINTING

PROBLEM TO BE SOLVED: To provide a method for manufacturing cylinders for intaglio printing capable of appropriately forming a fine pattern on a surface of the cylinder for intaglio printing, transferring the fine pattern required for printable electronics and a nanoimprint, using the cylinder and p...

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Bibliographische Detailangaben
1. Verfasser:	ITO KOJIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS SEMICONDUCTOR DEVICES STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for manufacturing cylinders for intaglio printing capable of appropriately forming a fine pattern on a surface of the cylinder for intaglio printing, transferring the fine pattern required for printable electronics and a nanoimprint, using the cylinder and performing the intaglio printing at high productivity, and to provide a cylinder for intaglio printing.SOLUTION: A cylinder 1 for intaglio printing includes: a columnar cylinder body 2; and a silicone sheet 3 stuck to the surface of the cylinder body 2 and having a fine pattern 5 formed thereon. A manufacture of the silicone coat 3 includes a step for preparing a silicone wafer 4 as a base material of the silicone coat 3, and a step for forming the fine pattern 5 on the surface of the silicone wafer 4 by patterning by lithography and anisotropic dry etching.