QUATERNARY AMMONIUM COMPOUND, METHOD OF MANUFACTURING THE SAME, AND DEVELOPER COMPOSITION CONTAINING THE SAME

PROBLEM TO BE SOLVED: To provide a strong basic quaternary ammonium compound, a method of manufacturing the compound, and a developer using the compound.SOLUTION: There is provided a quaternary ammonium compound expressed by (CH)NCHCHN(CH)-(OH). The compound can be manufactured by allowing methyl ha...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAHASHI FUMIHARU, HARA YASUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a strong basic quaternary ammonium compound, a method of manufacturing the compound, and a developer using the compound.SOLUTION: There is provided a quaternary ammonium compound expressed by (CH)NCHCHN(CH)-(OH). The compound can be manufactured by allowing methyl halide, dimethyl sulfate or dimethyl carbonate and N,N,N',N'- tetramethyl ethylenediamine to react with each other, and to be processed in strong base, and an aqueous solution containing the compound is used as a developer for a photoresist.