RESIST INSPECTION APPARATUS AND DEFECT INSPECTION METHOD OF MASK SUBSTRATE

PROBLEM TO BE SOLVED: To provide an apparatus for performing a resist pattern inspection without deteriorating the performance of the inspection apparatus in which, when inspecting a resist pattern of a mask substrate using a short-wavelength and high output light source, outgas is generated to caus...

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Bibliographische Detailangaben
Hauptverfasser:	KODERA YUTAKA, KUNIYA SHINJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an apparatus for performing a resist pattern inspection without deteriorating the performance of the inspection apparatus in which, when inspecting a resist pattern of a mask substrate using a short-wavelength and high output light source, outgas is generated to cause the deterioration of the performance of an optical system of the inspection apparatus.SOLUTION: A mask substrate 7 is fixed to a mask fixing holder 19 of the resist inspection apparatus to form a sealed space 31 with the surface of a resist 7a, a support 21, and a translucent protective member 22, and inert gas 27 is supplied to and exhausted from the sealed space 31 through vent holes 23 and 24 provided in the support 21. The outgas 28 generated by the application of the light 29 to the resist 7a is forcibly exhausted outside the sealed space 31 so as to prevent the deterioration of the inspection apparatus and allow the resist defect inspection in a mid-flow of a mask manufacturing step.