EVAPORATING DEVICE, GAS SUPPLY DEVICE, AND FILM DEPOSITION DEVICE USING GAS SUPPLY DEVICE

PROBLEM TO BE SOLVED: To provide an evaporating device capable of restraining blockage of a carrier gas outlet at a tip of an injection nozzle part for evaporating a liquid raw material.SOLUTION: An evaporating device 12 for forming a raw material gas by evaporating a liquid raw material 60 with car...

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Bibliographische Detailangaben
Hauptverfasser:	OKURA NARIYUKI, TAKEI JUNICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NOZZLES PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an evaporating device capable of restraining blockage of a carrier gas outlet at a tip of an injection nozzle part for evaporating a liquid raw material.SOLUTION: An evaporating device 12 for forming a raw material gas by evaporating a liquid raw material 60 with carrier gas comprises: an evaporation vessel 96, in which an evaporation chamber 94 is formed; an injection nozzle part 64 having a nozzle 122 for the liquid raw material emitting the liquid raw material at a center, and having a nozzle 124 for the carrier gas concentrically emitting the carrier gas to an outer periphery of the nozzle for the liquid raw material to form the raw material gas; a gas diffusion restraining block 100 whose opening angle gets enlarged at a sharp angle in an injection direction of the liquid raw material from the injection nozzle part to form a gas diffusion restraining region 130 opened toward the evaporation chamber; and a raw material gas outlet 84. This restrains blockage of the carrier gas outlet at the tip of the injection nozzle part evaporating the liquid raw material.