PARTICLE CAPTURING UNIT, MANUFACTURING METHOD OF PARTICLE CAPTURING UNIT AND SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a particle capturing unit in which the exhaust efficiency can be prevented from lowering.SOLUTION: A first trap unit 40a configuring a particle trap unit 40 exposed to a particle P flying space comprises: a first mesh-like layer 44 consisting of multiple first stainl...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TOYOIZUMI SHUNSUKE, MORIYA TAKESHI, TAKAHIRO KATSUYUKI
Format: Patent
Sprache:eng
Schlagworte:
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