PLASMA SPRAY METHOD FOR PRODUCING ION CONDUCTING MEMBRANE

PROBLEM TO BE SOLVED: To provide a plasma spray method capable of producing an ion conducting, in particular oxygen-permeable membrane solving problems of prior art and having improved quality.SOLUTION: In the plasma spray method for producing the ion conducting membrane having ion conductivity, the...

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Bibliographische Detailangaben
Hauptverfasser:	GINDRAT MALKO, DAMANI RAJIV J
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma spray method capable of producing an ion conducting, in particular oxygen-permeable membrane solving problems of prior art and having improved quality.SOLUTION: In the plasma spray method for producing the ion conducting membrane having ion conductivity, the membrane is deposited as a layer (11) on a substrate (10) in a process chamber; starting materials (P) are sprayed on the substrate (10) surface in the form of process beams (2) using process gas (G); and the starting materials are injected to plasma at a low process pressure not higher than 10,000 Pa to be partially/completely melted therein. During the spraying, oxygen (O2; 22) is supplied to the process chamber (12) in an amount of at least 1%, preferably at least 2%, of the whole amount of the process gas flow.