SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which a high frequency power is applied to a plurality of susceptors loading substrates, respectively, and the substrates are processed by heating the plurality of susceptors by induction heating, and which can ensure a soaking reg...

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Bibliographische Detailangaben
Hauptverfasser:	TANIUCHI MASAMICHI, MIYASHITA TOMOYASU, HIRANO MAKOTO, ISHII AKINORI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which a high frequency power is applied to a plurality of susceptors loading substrates, respectively, and the substrates are processed by heating the plurality of susceptors by induction heating, and which can ensure a soaking region in a lamination direction longer.SOLUTION: A substrate processing apparatus comprises: a susceptor holding member 217 holding a plurality of susceptors 150 in a lamination manner; a container 203 housing the plurality of susceptors; an induction coil 207 provided outside of the container; and a heat insulation member 360 provided outside of the container 203. The container 203 includes a closed part 270 on an upper side and a sidewall part 272. The heat insulation material 360 covers the closed part 270 of the container 203 and a region from the closed part 270 to a part of the sidewall part 272 to extend to between the sidewall part 272 and the induction coil 207.