SUBSTRATE LEVITATION TRANSPORT METHOD AND SUBSTRATE LEVITATION TRANSPORT DEVICE AND SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To improve consumption efficiency of high pressure gas for levitation while optimizing the levitation height or the position of a substrate in a levitation stage.SOLUTION: The levitation stage 10 in a resist coating apparatus sections the levitation surface of a carry-in region...

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Hauptverfasser: MIYAZAKI FUMIHIRO, INAMASU HISASHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve consumption efficiency of high pressure gas for levitation while optimizing the levitation height or the position of a substrate in a levitation stage.SOLUTION: The levitation stage 10 in a resist coating apparatus sections the levitation surface of a carry-in region Mand a carry-out region Mextending backward and forward of a coating region Min the conveyance direction into a large number of levitation areas. A large number of ejection nozzles 12 are arranged on these levitation surfaces. Ejection pressure of high pressure gas in each levitation area is on-off controlled independently or variably by an ejection pressure control unit.