APPARATUS AND METHOD FOR INSPECTING FILM THICKNESS UNEVENNESS

PROBLEM TO BE SOLVED: To provide an apparatus and a method for inspecting film thickness unevenness capable acquiring an image with brightness and contrast appropriate for inspection.SOLUTION: There are provided an apparatus and a method for inspecting film thickness unevenness, in which a substrate with a film formed thereon is moved in one direction while thickness unevenness of the film being inspected. The apparatus comprises a light source section, an imaging section 4, and a control section, and also comprises a film thickness detection section for detecting the film thickness. The light source section includes: a reflection illumination part 3a arranged on the imaging section side; and a transmission illumination part 3b arranged on the opposite side to the imaging section with the substrate interposed therebetween. The imaging section 4 includes imaging section angle adjustment means for adjusting a relative angle between the imaging section and the substrate. The reflection illumination part includes reflection illumination angle adjustment means for adjusting a relative angle between the reflection illumination part and the substrate. The transmission illumination part includes transmission illumination angle adjustment means for adjusting a relative angle between the transmission illumination part and the substrate. The control section adjusts a light quantity of the reflection illumination and a light quantity of the transmission illumination by controlling the reflection illumination angle adjustment means and the transmission illumination angle adjustment means, based on film thickness information from the film thickness detection section.