THIN-FILM SILICA MATERIAL AND METHOD FOR PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide material having a high effective utilization ratio, comprising a surface structure that can promote material transfer, and practical as a filter material, a catalyst carrier, an adsorbent, etc., and a method for producing the same.SOLUTION: This silica material is fo...

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Bibliographische Detailangaben
Hauptverfasser:	AKAMA HIROSHI, MISHIMA SHOJI, OKADA TOMOHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOSITIONS BASED THEREON COMPOUNDS THEREOF INORGANIC CHEMISTRY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY NON-METALLIC ELEMENTS ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide material having a high effective utilization ratio, comprising a surface structure that can promote material transfer, and practical as a filter material, a catalyst carrier, an adsorbent, etc., and a method for producing the same.SOLUTION: This silica material is formed in double thin-film structure curved in hemispherical cup shape, bowl shape or plate shape with a film thickness of 10-100 nm for use. The silica material preferably has its diameter of nano size to micro size level, and further preferably has a CH(methyl) group in its surface.