MICROLITHOGRAPHY PROJECTION OBJECTIVE

PROBLEM TO BE SOLVED: To suppress stray light for a micro-lithography projection objective which images into an image plane a pattern arranged in an objective plane.SOLUTION: A microlithography projection objective 10 is provided which images into an image plane a pattern arranged in an objective plane and comprises a first objective part 16, a second objective part 18 and at least one third objective part 20. The second objective part 18 defines a light propagation direction that differs from a light propagation direction in the first objective part 16 and from a light propagation direction in the third objective part 20. At least one beam deflecting device 22 is further provided between the first objective part 16 and the second objective part 18 and between the second objective part 18 and the third objective part 20. At least one shield 24 is arranged in the region of the beam deflecting device 22 in such a way that direct light leakage from the first objective part 16 into the third objective part 20 is at least reduced.