DRYING DEVICE AND THERMAL PROCESSING SYSTEM

PROBLEM TO BE SOLVED: To provide a drying device can efficiently drying a coated film while suppressing the increase of a consumption amount of hot air, and a thermal processing system in which the drying device is incorporated.SOLUTION: A substrate 5 on which the coated film is formed by means of a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KANDA HIROYUKI, YAMAKOSHI JUNICHI, ICHIBE NOBUO, TANAKA IWAO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a drying device can efficiently drying a coated film while suppressing the increase of a consumption amount of hot air, and a thermal processing system in which the drying device is incorporated.SOLUTION: A substrate 5 on which the coated film is formed by means of a coating process is transported from a preheating part 20 to a drying part 40, and is dried. The preheating part 20 does not blow hot air directly from above the substrate 5 on which the coating film just after coating is formed. Instead, the coated film is preheated by infrared radiation and indirect blowing of hot air from below. The drying part 40 promotes the evaporation of a solvent by blowing hot air directly from above and below the preheated substrate 5. Furthermore, the hot air which sequentially passes through three ventilation boxes 25 in the preheating part 20 is guided by an air conduit 35 to upper hot air ejection parts 45 of the drying part 40, and the hot air used to heat the ceramic plates in the preheating part 20 is reused in the drying part 40.