SCANNING CHARGED-PARTICLE MICROSCOPE AND SPECIMEN OBSERVATION METHOD

PROBLEM TO BE SOLVED: To provide a scanning charged-particle microscope in which distortion of measurement, even of an insulator pattern, in the field of view can be suppressed by suppressing the impact of charging due to primary charged-particle beam irradiation during photographing, and suppressin...

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Bibliographische Detailangaben
Hauptverfasser:	TEI TOMOKI, HITOMI KEIICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a scanning charged-particle microscope in which distortion of measurement, even of an insulator pattern, in the field of view can be suppressed by suppressing the impact of charging due to primary charged-particle beam irradiation during photographing, and suppressing change in the detection rate of secondary charged-particles.SOLUTION: In the scanning charged-particle microscope which forms the image of a scanning area by performing the scanning for the two-dimensional area on a specimen 8 so as to reverse the line scanning direction of a charged-particle beam 4 alternately, the distance between the scan lines of charged-particle beam 4 is adjusted based on the charging characteristics of the specimen 8 or the uniformity of lightness in the field of view of the specimen 8, when the specimen 8 is irradiated with the charged-particle beam 4.