HEAT TREATMENT DEVICE

PROBLEM TO BE SOLVED: To provide a heat treatment device that prevents treatment gas component from being deposited on the inner wall of a heat treatment chamber.SOLUTION: A container 20 storing an object to be treated is heated in a heat treatment chamber 10 as an object to be heated. Treatment gas...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ISHII YOSHIICHI, TSUDA KATSUMI, TAKAHASHI NAOKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING KILNS LIGHTING MECHANICAL ENGINEERING OPEN SINTERING OR LIKE APPARATUS OVENS RETORTS SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a heat treatment device that prevents treatment gas component from being deposited on the inner wall of a heat treatment chamber.SOLUTION: A container 20 storing an object to be treated is heated in a heat treatment chamber 10 as an object to be heated. Treatment gas supplied from a gas supply part is introduced into the container 20 through a pipe 42 or the like, and discharged to a pump part through a pipe 52 or the like. A gas passage formed by the pipes 42, 52 are separated from a space of the heat treatment chamber 10, thereby preventing the treatment gas from leaking to the space in the heat treatment chamber 10.