METHOD AND DEVICE FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide a pattern forming method and device that can simply form a pattern by using a block copolymer.SOLUTION: The pattern forming method includes: forming a film of a block copolymer, including at least two kinds of polymers, on a substrate; heating the block copolymer fil...

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Bibliographische Detailangaben
Hauptverfasser:	MURAMATSU MAKOTO, KIYONO YURIKO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES INKS MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MANUFACTURE OR TREATMENT THEREOF MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS NANOTECHNOLOGY NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pattern forming method and device that can simply form a pattern by using a block copolymer.SOLUTION: The pattern forming method includes: forming a film of a block copolymer, including at least two kinds of polymers, on a substrate; heating the block copolymer film; irradiating the heated block copolymer film with UV light; and supplying a developing solution to the UV light-irradiated block copolymer film.