CHARGED PARTICLE BEAM APPARATUS

PROBLEM TO BE SOLVED: To provide a method of neutralizing a charged part, occurring in a region of a specimen irradiated with a charged particle beam, at high speed without mounting another device anew on a charged particle beam apparatus.SOLUTION: In a stage after irradiating a charged particle bea...

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Bibliographische Detailangaben
Hauptverfasser: NISHIHARA MAKOTO, TEI TOMOKI, MATSUI HIROYUKI, KOMURO OSAMU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of neutralizing a charged part, occurring in a region of a specimen irradiated with a charged particle beam, at high speed without mounting another device anew on a charged particle beam apparatus.SOLUTION: In a stage after irradiating a charged particle beam for measurement of a specimen before starting next measurement, a retarding voltage and/or an acceleration voltage is adjusted, and the operation is controlled so that neutralization is performed by reducing the difference between the value of the retarding voltage and the value of the acceleration voltage when compared with the difference during measurement. Since a charged part, occurring in a region of a specimen irradiated with a charged particle beam, can be neutralized without mounting another device on a charged particle beam apparatus, neutralization can be carried out without lowering the throughput.