METHOD FOR FORMING INSULATING PATTERN AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT

PROBLEM TO BE SOLVED: To provide a method for forming an insulating pattern, which is capable of achieving a thick-film pattern with high definition even when recoating is performed many times.SOLUTION: The method for forming an insulating pattern comprises a step of pattern-printing an insulating p...

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Bibliographische Detailangaben
Hauptverfasser:	KUSANO KAZUTAKA, TOMINAGA KANOKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CONDUCTORS ELECTRICITY GLASS INSULATORS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for forming an insulating pattern, which is capable of achieving a thick-film pattern with high definition even when recoating is performed many times.SOLUTION: The method for forming an insulating pattern comprises a step of pattern-printing an insulating paste on a substrate and exposing the insulating paste, and a step of firing the insulating paste after repeating the previous step two or more times. The method for forming an insulating pattern is characterized in that: the insulating paste contains an insulating inorganic powder and a photosensitive organic component; and a content of an organic solvent in the insulating paste is 5 mass% or less.