COATING SOLUTION FOR FORMATION OF LOW-REFLECTIVE FILM, METHOD FOR PREPARATION THEREOF AND LOW-REFLECTIVE MEMBER PRODUCED BY USING THE SAME

PROBLEM TO BE SOLVED: To provide a coating solution for forming a low-reflective film on a base material, having a low refractive index and low reflectance in the form of a monolayered film and easily forming a large surface area film in a simpler manner, a method for preparing the coating solution,...

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Bibliographische Detailangaben
Hauptverfasser:	SUGIMOTO TOSHIAKI, TAKANOBU HISAFUMI, HARA IKUNARI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a coating solution for forming a low-reflective film on a base material, having a low refractive index and low reflectance in the form of a monolayered film and easily forming a large surface area film in a simpler manner, a method for preparing the coating solution, and a low-reflective member produced by using the coating solution.SOLUTION: The coating solution for forming the low-reflective film on a base material comprises a dispersion liquid containing colloidal silica and ≥5 mass% and ≤40 mass% of a tungsten compound in terms of oxide based on the amount of colloidal silica. The coating solution uses rod-like colloidal silica having a major diameter of ≥5 nm and ≤100 nm, spherical colloidal silica having a particle diameter of ≥5 nm and ≤50 nm, and the tungsten compound.