OXIDE SINTERED BODY AND SPUTTERING TARGET

PROBLEM TO BE SOLVED: To provide an oxide sintered body which is suitably used in the production of an oxide semiconductor film for a display device, the sintered body concerned having both high conductivity and high relative density and forming an oxide semiconductor film which has high carrier mob...

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Bibliographische Detailangaben
Hauptverfasser: GOTO YASUSHI, IWASAKI YUKI, YONEDA YOICHIRO, TOKUHIRA MASAYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an oxide sintered body which is suitably used in the production of an oxide semiconductor film for a display device, the sintered body concerned having both high conductivity and high relative density and forming an oxide semiconductor film which has high carrier mobility.SOLUTION: The oxide sintered body is obtained by mixing powdered zinc oxide, powdered tin oxide and powdered indium oxide together and then sintering the mixture. In addition, when the sintered body of an oxide is subjected to X-ray diffraction, it has a phase of ZnSnOas a primary phase and a solid solution of In/InO-ZnSnOin which In and/or InOis solid-solved in ZnSnO, and a phase of ZnInO(x, y and z are optional positive integers) is not detected.