ION MILLING APPARATUS AND ION MILLING PROCESSING METHOD

PROBLEM TO BE SOLVED: To prepare a sample cross section that is desired for the observation and analysis and suppresses generation of void and unevenness derived from a dissimilar material in preparation of a cross-sectional sample.SOLUTION: Tilt oscillation is performed on a sample 3 for optical ax...

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Bibliographische Detailangaben
Hauptverfasser: TAKASU HISAYUKI, UENO ATSUSHI, KOI ASAMI, WATANABE TOSHIYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prepare a sample cross section that is desired for the observation and analysis and suppresses generation of void and unevenness derived from a dissimilar material in preparation of a cross-sectional sample.SOLUTION: Tilt oscillation is performed on a sample 3 for optical axis (Z-axis) of ion beam 2, and the ion beam 2 is radiated to a processing surface 3a at low angle by repeating inclination and inclination recovery between a surface condition where the processing surface 3a of the sample 3 is oriented to an inclined axis direction (Y-axis direction) and a tilt surface condition where a sample stand side portion of the processing surface 3a projects to the inclined axis direction (Y-axis direction) with compared to a mask side portion of the processing surface 3a, from the surface condition, thereby suppressing void 61 and unevenness 63 derived from a dissimilar material 62.