PELLICLE FOR LITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a pellicle for lithography that prevents distortion of a mask mostly even when the pellicle is bonded to the mask.SOLUTION: A pellicle film is stretched to be disposed on one end face of a pellicle frame via an adhesive layer, while an adhesive layer whose face on a...

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Bibliographische Detailangaben
1. Verfasser:	SHIRASAKI SUSUMU
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS,e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES,DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS CONVEYING ELECTROGRAPHY HANDLING THIN OR FILAMENTARY MATERIAL HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PACKAGES PACKAGING ELEMENTS PACKING PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS STORING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pellicle for lithography that prevents distortion of a mask mostly even when the pellicle is bonded to the mask.SOLUTION: A pellicle film is stretched to be disposed on one end face of a pellicle frame via an adhesive layer, while an adhesive layer whose face on a mask bonding side is flat is disposed on the other end face of the pellicle frame, and the adhesive force of the adhesive layer is in a range of 1 N/m to 100 N/m. It is desirable that the flatness of the face on the mask bonding side of the adhesive layer is 15 μm or less and the flatness of the face of the adhesive layer to which the pellicle film is bonded is 15 μm or less.