ION SOURCE, SYSTEM AND METHOD

ION SOURCE, SYSTEM AND METHOD

PROBLEM TO BE SOLVED: To provide a system having an electric field ion source capable of generating ion beams having spot sizes, each of which the dimension is 10 nm or less, on a sample surface.SOLUTION: The system includes: a scanning electron microscope capable of providing electron beams; a gas...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LEWIS S FALKUS III, JOHN A NOTTE IV, RANDOLPH G PERCIVAL, MANTZ ULRICH, RAYMOND HILL, BILLY W WARD, MICHAEL STEIGERWALD
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a system having an electric field ion source capable of generating ion beams having spot sizes, each of which the dimension is 10 nm or less, on a sample surface.SOLUTION: The system includes: a scanning electron microscope capable of providing electron beams; a gas electric field ion source in which ion beams can be generated through interaction with the gas; and a focused ion beam apparatus. The scanning electron microscope and the gas electric field ion source are located so that a sample can be inspected using the electron beams and the ion beams in use.