POSITIONING SYSTEM AND METHODS FOR LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first...

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Hauptverfasser:	HUIJBREGTSE JEROEN, VAN BILSEN FRANCISCUS BERNARDUS MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, TOLSMA HOITE PIETER THEODOOR, HUBERTUS JOHANNES GERTRUDUS SIMONS, BURGHOORN JACOBUS, NAVARRO Y KOREN RAMON, MEGENS HENRY, SCHETS SICCO IAN, HINNEN PAUL CHRISTIAAN, SCHUURHUIS JOHNY RUTGER, DUNBAR ALLAN, VAN HORSSEN HERMANUS GERARDUS, LEE BRIAN, JUENINK ANDRE BERNARDUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first detector channel and a second detector channel; and a position determining unit that communicates with the detection system. The position determining unit processes information from the first and second detector channels in combination, and determines a position of a positioning mark on a first object relative to a reference position on a second object, based on the combined information.