VAPORIZER

PROBLEM TO BE SOLVED: To provide a vaporizer for MOCVD, which can obtain a vaporized gas in which a raw material solution is uniformly dispersed, and to provide a method for vaporizing the raw material solution.SOLUTION: The vaporizer comprises: (1) a distribution part 8 which includes a gas introdu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FUKAGAWA MITSURU, YAMAMOTO KOHEI, UCHIZAWA OSAMU, KANNO YOICHI, KUSUHARA MASAKI, MEGURO TOSHIKATSU, DOI MIKIO, TODA MASAYUKI, UMEDA MASARU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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